Title:
STYRENE DERIVATIVE
Document Type and Number:
Japanese Patent JP3900240
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To obtain a new styrene derivative having a styrene skeleton useful as a monomer for producing a base polymer for a chemically amplified resist material suitable for a mier of abrication technique.
SOLUTION: This styrene derivative is represented by the general formula (1) (wherein R1 is H, a 1-20C linear, branched or cyclic alkyl, an F-substituted alkyl, Cl atom or trichloromethyl; R2 is a protecting group of phenol; and (p), (q), (r) are each 0 or a natural number of 0≤p<5, 0≤q<5, 0<r<5 and satisfy 0<p+q<5. A resist material prepared by using a polymer obtained by polymerizing the styrene derivative is sensitive to high energy beam and excellent in sensitivity, resolution and plasma etching resistance at ≤200 nm especially ≤170 nm wave length. The compound can be a suitable raw material for a base polymer of a resist material having small absorption at an exposure wavelength of F2 excimer laser. The resist material using the compound can easily form a fine pattern vertical to the substrate and is suitable for a fine pattern producing material for producing a very-large-scale integration system (VLSI).
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Inventors:
Mutsuko Nakajima
Jun Hatakeyama
Jun Watanabe
Yuji Harada
Jun Hatakeyama
Jun Watanabe
Yuji Harada
Application Number:
JP2000265050A
Publication Date:
April 04, 2007
Filing Date:
September 01, 2000
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
C07C43/225; C07D309/12; C07C39/24; C07C39/26; C07C69/63; C07C69/96; C07F7/18; C08F12/22; C08F12/34; C08F14/02; C08F14/18; (IPC1-7): C07C43/225; C07C39/26; C07C69/63; C07C69/96; C07D309/12; C07F7/18; //C08F12/22; C08F12/34; C08F14/02; C08F14/18
Domestic Patent References:
| JP10306120A | ||||
| JP11236416A | ||||
| JP10298236A |
Other References:
Yamaguchi M et al.,Ortho-Vinylation Reaction of Phenols with Ethyne,J.Org.Chem.,63(21), 1998,7298-7305
Attorney, Agent or Firm:
Takashi Kojima
Yuko Nishikawa
Yoshihiro Nagare
Yuko Nishikawa
Yoshihiro Nagare