SUBLIMATION GAS SUPPLY SYSTEM AND SUBLIMATION GAS SUPPLY METHOD

Japanese Patent JP2017205736

A

PROBLEM TO BE SOLVED: To provide a sublimation gas supply system with which a sublimation gas concentration of a supplied solid material can be stabilized, and further a sublimation gas with a stabilized concentration can be continuously supplied.SOLUTION: A sublimation gas supply system has: a vessel 11; a heater 12 to heat the vessel 11; a vacuum vessel T1 configured such that the sublimation gas is introduced thereinto from the vessel 11 under vacuum when the pressure measured by a vessel pressure gauge 14 is equal to the saturation vapor pressure of the sublimation gas; a flow rate control part to control the flow of a dilution gas such that the sublimation gas in the dilution gas is controlled so as to have a predetermined concentration based on the pressure in the vacuum vessel in the case of introduction of the sublimation gas into the vacuum vessel T1; and a lead-out line to lead the sublimation gas from the vacuum vessel T1 to the subsequent process when the concentration of the sublimation gas in the dilution gas gets to a predetermined concentration.SELECTED DRAWING: Figure 1

SHIGAKI CHIKA
SUZUKI SAYAKA
KOURA TERUMASA
NOZAWA FUMIKAZU

JP2016101661A

November 24, 2017

May 20, 2016

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AIR LIQUIDE JAPAN LTD

B01J4/00; B01J7/00; C23C16/448

JPH03141192A	1991-06-17
JP2014108395A	2014-06-12
JPS60244332A	1985-12-04
JPH08980A	1996-01-09
JP2004223431A	2004-08-12
JPS5756769U	1982-04-02
JP2003117380A	2003-04-22
JPH10158843A	1998-06-16
JP2013028854A	2013-02-07

Patent Business Corporation Unias International Patent Office

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