Title:
SUBSTITUTED O-PHTHALALDEHYDE, ITS PRODUCTION AND COMPOUND USED IN SYNTHESIS THEREOF
Document Type and Number:
Japanese Patent JPS62175488
Kind Code:
A
Abstract:
There are disclosed novel substituted o-phthalaldehydes of formula I (I) wherein at least one of the substituents R1, R2, R3, R4 is Q(alkyl)3, -CH2-Q(alkyl)3, -O-Q(alkyl)3, -Q(aryl)3 or -Q(alkylenearyl)3, wherein Q is Si, Sn or Ge, the alkyl moieties contain 1 to 12 carbon atoms, the aryl groups contain 6 or 12 ring carbon atoms and the alkylene radicals contain 1 to 4 carbon atoms, and each of the remaining substituents R1 to R4 is a hydrogen or halogen atom or a cyano, nitro, carboxyl or hydroxyl group, a C1-C4alkoxy, C1-C4alkylthio or an alkoxycarbonyl group containing 1 to 4 carbon atoms in the alkoxy moiety. The novel o-phthalaldehydes can be polymerized to give polymers that can be used as photoresists.
Inventors:
ARUFURETSUDO SUTAINMAN
Application Number:
JP887287A
Publication Date:
August 01, 1987
Filing Date:
January 16, 1987
Export Citation:
Assignee:
CIBA GEIGY AG
International Classes:
C07F7/08; C07F7/22; C07F7/30; C08G2/00; C08G2/10; C08G2/14; G03F7/039; G03F7/075; (IPC1-7): C07F7/08; C07F7/22; C07F7/30; C08G2/14
Attorney, Agent or Firm:
Kaname Yumi
Previous Patent: JPS62175487
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