Title:
SUBSTRATE AGENT AND PATTERN FORMATION METHOD
Document Type and Number:
Japanese Patent JP2014185311
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a substrate agent which enables production of a substrate provided with a nano structure in which positions and orientation are designed more freely on the surface of the substrate by using phase separation of a block copolymer and allows easy distinguished use for purposes by selecting the type of a block copolymer used, and to provide a method of forming a pattern of a layer containing a block copolymer by using the substrate agent.SOLUTION: A substrate agent for phase separation of a layer containing a block copolymer composed of a plurality of kinds of blocks formed on a substrate includes a resin ingredient, and the resin ingredient contains 90 mol% or more structural units originated from aromatic ring-containing monomers and mol5% or less structural units derived from methacrylic acid or a methacrylate ester.
Inventors:
KUROSAWA TSUYOSHI
SHIONO HIROHISA
MIYAGI MASARU
MATSUMIYA YU
MIYASHITA KENICHIRO
OMORI KATSUMI
SHIONO HIROHISA
MIYAGI MASARU
MATSUMIYA YU
MIYASHITA KENICHIRO
OMORI KATSUMI
Application Number:
JP2013137276A
Publication Date:
October 02, 2014
Filing Date:
June 28, 2013
Export Citation:
Assignee:
TOKYO OHKA KOGYO CO LTD
International Classes:
C09D125/00; B05D7/24; B82Y30/00; B82Y40/00; C09D5/00; H01L21/312; H01L21/027
Domestic Patent References:
| JP2010053263A | 2010-03-11 | |||
| JP2012061531A | 2012-03-29 | |||
| JP2013226692A | 2013-11-07 |
Attorney, Agent or Firm:
Sumio Tanai
Masatake Shiga
Mitsuyoshi Suzuki
Igarashi Mitsunaga
Masatake Shiga
Mitsuyoshi Suzuki
Igarashi Mitsunaga
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