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Patent Searching and Data


Title:
SUBSTRATE ALIGNING DEVICE
Document Type and Number:
Japanese Patent JP2002064297
Kind Code:
A
Abstract:

To provide a substrate aligning device where a work load accompanying visual operation is reduced by preventing variation in positioning precision among operators, which occurs when visually aligning with a naked eye or through a microscope.

A probe 3 comprises a reference measuring piece 31 and a plurality of resistance measuring pieces a32-d35, and judges alignment state of a substrate 1 based on an electric resistance value by measuring the electric resistance value of a reference original-point mark 2 provided at the substrate 1. Based on presence of continuity between the reference measuring piece 31 and the resistance measuring pieces a32-d35, moving direction and moving amount of a stage 13 on which the substrate 1 is mounted are controlled by a stage driving/controlling part 11 for correcting position of the substrate 1.


Inventors:
FUKAMI YOSHIYUKI
Application Number:
JP2000251222A
Publication Date:
February 28, 2002
Filing Date:
August 22, 2000
Export Citation:
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Assignee:
NEC IBARAKI LTD
International Classes:
H05K13/04; (IPC1-7): H05K13/04
Attorney, Agent or Firm:
Naoki Kyomoto (2 outside)