Title:
SUBSTRATE BAKING DEVICE, SUBSTRATE BAKING METHOD, AND COATING FILM FORMING DEVICE
Document Type and Number:
Japanese Patent JP3853256
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a baking device for baking a coating film that is formed by applying chemicals, which is capable of trapping sublimates originated from the coating film, keeping the inner pressure of a closed vessel at a prescribed value, and reducing a load of maintenance operation imposed on an operator.
SOLUTION: A trapping unit, which traps sublimates originating from a resist film formed on the surface of a substrate, is provided in the exhaust path of the closed vessel composed of a heating plate and a lid. The position of the trapping unit is close to the closed vessel, and the inner pressure of the trapping unit can be monitored by a pressure monitoring means. The trapping unit increases the inner pressure with the increase of the sublimates in amount, so that the trapping unit is dismounted and cleaned when a detected pressure value reaches a prescribed level to issue an alarm.
Inventors:
Mitsuhiro Tagami
Application Number:
JP2002154242A
Publication Date:
December 06, 2006
Filing Date:
May 28, 2002
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
G03F7/16; H01L21/027; B05C9/14; B05D3/02; (IPC1-7): H01L21/027; B05C9/14; B05D3/02; G03F7/16
Domestic Patent References:
| JP11300153A | ||||
| JP3209714A | ||||
| JP8218174A | ||||
| JP2000031005A | ||||
| JP2002008967A | ||||
| JP2002057133A |
Attorney, Agent or Firm:
Toshio Inoue
Mizuno Hiromi
Mizuno Hiromi
Previous Patent: HYDRAULIC DRIVE COOLING FAN UNIT
Next Patent: MOSQUITO DISTORTION REDUCTION DEVICE AND ITS METHOD
Next Patent: MOSQUITO DISTORTION REDUCTION DEVICE AND ITS METHOD