To provide a substrate carry-in/out structure where the rotor weight is small, rotary balance is stabilized, and at the same time waterdrops do not scatter or re-adhere onto the substrate.
This horizontal shaft substrate rotary drying device is provided with a substrate placement 50 that is provided at a substrate retention 3 of a rotor 2 so that it can pass and be elevated without any interference and places and retains a plurality of wafers W, W,..., and a substrate elevation 51 that is arranged at the lower outside of a chamber 1 for elevating the substrate placement 50. The substrate placement 50 is elevated between a substrate passage position A of the upper outside of the chamber 1 and a standby position B of the lower portion of the rotor 2 by the elevation drive of the substrate elevation 51, and at the same time carries is or carries out the wafers W, W,..., for the substrate retention 3 for the rotor 2 in the middle of the elevation operation.
SHIMIZU TETSUYA
KATO TAKAAKI
ONO YUJI
TSUGAWA TERMINAL KK