To reduce the deviation of a substrate at the time of transferring the substrate and to shorten a time for the fine alignment of a substrate stage, as for a substrate carrying device.

A mask M is carried from a mask library 11 to a mask stand by part 13 by a carrying arm 12. In the mask stand-by part 13, the deviation of the mask M from a reference position is detected by pre-alignment parts 13a to 13i. The mask M is loaded from the mask stand-by part 13 to a mask stage MS by an interchangeable arm 14. The mask stage MS is shifted by the amount of the deviation detected by the pre-alignment parts 13a to 13i so as to compensate the deviation of the mask M from the reference position.