To provide a new substrate cleaning device for cleaning a substrate such as glass substrate, which is typified by a glass substrate for liquid crystal.

The substrate cleaning device is provided with a substrate supporter for conveying the substrate with its one surface oriented upwardly, a reservoir tank positioned under the substrate and formed of a flat plate forming a flat surface directed upward with a distance D from the one surface and side plates forming side faces surrounding a liquid reserving space capable of reserving a liquid between the flat plate and the substrate and having a clearance between the top ends of the side plates and the other surface, an ultrasonic wave oscillator oscillating ultrasonic waves directed upwardly from the flat surface, a lower liquid feeder feeding a first liquid to the liquid reserving space, and an upper liquid feeder feeding a second liquid to the one surface of the substrate.