Title:
SUBSTRATE CLEANING DEVICE
Document Type and Number:
Japanese Patent JP2006332534
Kind Code:
A
Abstract:
To provide a substrate cleaning device of simple mechanisms capable of precisely controlling a pressing load.
The substrate cleaning device is provided with a substrate retaining/rotating mechanism 11-18 for retaining and rotating the substrate, a brush retaining/rotating mechanism 22-26 for retaining and rotating a cleaning brush 21, and a pressing mechanism 27-32 for pressing the mechanism 22-26 onto the substrate retained by the substrate retaining/rotating mechanism and displacing the mechanism 22-26 in a vertical direction. The pressing mechanism is provided with an air bag 31, through which pressing is applied.
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Inventors:
KAWANISHI SHINGO
TAKAHASHI HIROHIKO
TAKAHASHI HIROHIKO
Application Number:
JP2005157542A
Publication Date:
December 07, 2006
Filing Date:
May 30, 2005
Export Citation:
Assignee:
TOKYO SEIMITSU CO LTD
International Classes:
H01L21/304; B08B1/04; G02F1/1333
Attorney, Agent or Firm:
Atsushi Aoki
Jun Tsuruta
Tetsuro Shimada
Yoshio Mizutani
Koichi Itsubo
Masaya Nishiyama
Jun Tsuruta
Tetsuro Shimada
Yoshio Mizutani
Koichi Itsubo
Masaya Nishiyama