Title:
SUBSTRATE DRYING APPARATUS
Document Type and Number:
Japanese Patent JP2010069392
Kind Code:
A
Abstract:
To provide a substrate drying apparatus reduced in an amount of air used for drying without lowering a carrying speed of a large glass substrate carried in a high speed.
The substrate drying apparatus includes a trapezoidal hood 20 with an opening gradually increasing from an inlet for carrying in the large glass substrate 10 toward an outlet for carrying it out, air knives 30-1, 30-2 jetting dry air onto both faces of the large glass substrate 10, and an ionizer 40 disposed on one face of the large glass substrate 10 and generating ions.
Inventors:
KITAGAWA KENICHI
TAKISHITA KAZUHIRO
TAKISHITA KAZUHIRO
Application Number:
JP2008238125A
Publication Date:
April 02, 2010
Filing Date:
September 17, 2008
Export Citation:
Assignee:
SHIMADA PHYSICAL CHEM IND CO
International Classes:
B08B5/04
Attorney, Agent or Firm:
Makoto Hagiwara
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