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Patent Searching and Data


Title:
SUBSTRATE DRYING EQUIPMENT
Document Type and Number:
Japanese Patent JP2003083675
Kind Code:
A
Abstract:

To provide a substrate drying equipment that can reduce the load of factory and can improve the drying performance of a drying chamber by controlling the air flow in the chamber.

This substrate drying equipment is provided with transport rollers 38 which transport a glass substrate G in a prescribed direction, first nozzles 53a and 53b and second nozzles 54a and 54b which dry the transported substrate G by removing the liquid adhering to the substrate G by blowing air upon the substrate G, and a blower fan 60 which supplies the air to the nozzles 53a, 53b, 54a, and 54b. This equipment is also provided with exhaust ports 55a and 55b provided in a first area on the upstream side in the transporting direction and a fan filter unit 52 provided in a third area C on the downstream side in the transporting direction. Since the blower fan 60 is provided, the load of factory can be reduced and mist-containing air can be discharged efficiently to the outside by controlling the air flow in the drying chamber.


Inventors:
Sada, Tetsuya
Shinozaki, Masaya
Application Number:
JP2001000273611
Publication Date:
March 19, 2003
Filing Date:
September 10, 2001
Export Citation:
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Assignee:
TOKYO ELECTRON LTD
International Classes:
G02F1/13; F26B15/00; G02F1/1333; H01L21/304; (IPC1-7): F26B15/00; G02F1/13; G02F1/1333