Title:
基板乾燥方法及び装置
Document Type and Number:
Japanese Patent JP3990322
Kind Code:
B2
Abstract:
A dry disk is provided at predetermined distance above a process substrate (S). A gas is discharged from an opening formed on the dry disk, so as to remove particle from substrate surface. An independent claim is also included for substrate drying apparatus.
Inventors:
Masamitsu Ito
Application Number:
JP2003173564A
Publication Date:
October 10, 2007
Filing Date:
June 18, 2003
Export Citation:
Assignee:
Toshiba Corporation
International Classes:
F26B11/18; F26B21/14; H01L21/304; H01L21/00
Domestic Patent References:
| JP8078368A | ||||
| JP2002219424A | ||||
| JP2002110627A | ||||
| JP2002141324A |
Attorney, Agent or Firm:
Takehiko Suzue
Satoshi Kono
Makoto Nakamura
Kurata Masatoshi
Sadao Muramatsu
Ryo Hashimoto
Satoshi Kono
Makoto Nakamura
Kurata Masatoshi
Sadao Muramatsu
Ryo Hashimoto