Title:
SUBSTRATE FOR ELECTRON AMPLIFICATION AND METHOD FOR MANUFACTURING SUBSTRATE FOR ELECTRON AMPLIFICATION
Document Type and Number:
Japanese Patent JP2014170642
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a substrate for electron amplification which can achieve a sufficient amplification factor while suppressing the occurrence of discharge in electron avalanche amplification, and to provide a method for manufacturing such a substrate for electron amplification.SOLUTION: A substrate 10 for electron amplification comprises an insulating glass base 11, conductive layers 12 and 13 formed on both of principal surfaces of the glass base 11, and through-holes 15 formed in a laminate 14 of the glass base 11 and the conductive layers 12 and 13. The substrate for electron amplification is arranged so that electric fields inside the through-holes 15 are formed by a potential difference between the conductive layers when a voltage is put between the surfaces of the conductive layer, thereby causing electron avalanche amplification inside the through-holes. In the substrate for electron amplification, insulating parts 20 are formed on at least one principal surface of the glass base 11 so that one ends surround openings of the through-holes 15 of the glass base 11, and the other ends are in contact with ends 12a, 13a of the conductive layers.
Inventors:
FUSHIE TAKASHI
Application Number:
JP2013041016A
Publication Date:
September 18, 2014
Filing Date:
March 01, 2013
Export Citation:
Assignee:
HOYA CORP
International Classes:
H01J47/02; G01T1/18; G01T3/00
Attorney, Agent or Firm:
Ani store Setsuo
Oil well 透
Hitoshi Seino
Masahiro Fukuoka
Tomohiro Okuyama
Oil well 透
Hitoshi Seino
Masahiro Fukuoka
Tomohiro Okuyama
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