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Title:
SUBSTRATE HANDLER
Document Type and Number:
Japanese Patent JP2009231846
Kind Code:
A
Abstract:

To provide a substrate handler capable of functioning more efficiently.

The substrate handler 12 is adapted to load a substrate 8 onto a substrate table 6 before exposure and to unload the substrate 8 from the substrate table 6 after exposure. The substrate handler 12 includes at least one support surface adapted to simultaneously convey a plurality of independent substrates 8, 8, or platforms 14, 16. The substrate handler 12 moves the substrate 8 with respect to the substrate table 6 of a lithographic apparatus.


Inventors:
JACOBS HERNES
LUTTIKHUIS BERNARDUS ANTONIUS
VAN DER SCHOOT HARMEN KLAAS
VOSTERS PETRUS MATTHIJS HENRIC
Application Number:
JP2009146010A
Publication Date:
October 08, 2009
Filing Date:
June 19, 2009
Export Citation:
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Assignee:
ASML NETHERLANDS BV
International Classes:
H01L21/027; G03F7/20; H01L21/677
Domestic Patent References:
JPH0685033A1994-03-25
JPH0878302A1996-03-22
JP2004063934A2004-02-26
JP2004247548A2004-09-02
JPH0685033A1994-03-25
JPH0878302A1996-03-22
JP2004063934A2004-02-26
Attorney, Agent or Firm:
Sakaki Morishita



 
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