Title:
SUBSTRATE FOR HEAT DEVELOPABLE PHOTOSENSITIVE MATERIAL, ITS PRODUCING METHOD AND HEAT DEVELOPABLE PHOTOSENSITIVE MATERIAL
Document Type and Number:
Japanese Patent JP2001215655
Kind Code:
A
Abstract:
To provide a substrate for a heat developable photosensitive material for plate making excellent in dimensional stability even at a high temperature by heat development and excellent further in planeness and scuffing resistance, and to provide a method for producing the substrate and a heat developable photosensitive material.
The substrate for a heat developable photosensitive material is produced by heat-treating a biaxially stretched polyester base for a heat developable photosensitive material using a polyester resin containing 0.001-5 wt.% polyfunctional carboxylic acid and/or polyol at a temperature between Tg+50°C and Tg+120°C under 0.01-20 kg/cm2 tension in conveyance before coating with at least one photographic constituent layer.
Inventors:
EZURE HIDETOSHI
ONUMA KENJI
HOSOI YUJI
ONUMA KENJI
HOSOI YUJI
Application Number:
JP2000025860A
Publication Date:
August 10, 2001
Filing Date:
February 03, 2000
Export Citation:
Assignee:
KONISHIROKU PHOTO IND
International Classes:
G03C1/76; B29C71/02; C08G63/12; C08J5/18; G03C1/498; (IPC1-7): G03C1/76; B29C71/02; C08G63/12; C08J5/18; G03C1/498
Attorney, Agent or Firm:
Nobuaki Sakaguchi