Title:
リソグラフィ装置において使用される基板ホルダ
Document Type and Number:
Japanese Patent JP7350906
Kind Code:
B2
Abstract:
A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder having a main body having a main body surface, a plurality of main burls projecting from the main body surface, wherein each main burl has a distal end surface configured to support the substrate, a first seal member projecting from the main body surface and having an upper surface, the first seal member surrounding the plurality of main burls and configured to restrict the passage of liquid between the substrate and the main body surface radially inward past the first seal member, and a plurality of minor burls projecting from the upper surface of the first seal member, wherein each minor burl has a distal end surface configured to support the substrate.
Inventors:
Rosette, Neek, Jacobs, Johannes
Fermeren, marx, martinus, petrus, adrianas
Ravensbergen, Simon, Charles
Bachen, Marc, Constant, Johannes
Kramer, This
Timamance, Roger, Anton, Marie
Van den Bergmortel, Frank, Peter, Alberto
Fermeren, marx, martinus, petrus, adrianas
Ravensbergen, Simon, Charles
Bachen, Marc, Constant, Johannes
Kramer, This
Timamance, Roger, Anton, Marie
Van den Bergmortel, Frank, Peter, Alberto
Application Number:
JP2022008547A
Publication Date:
September 26, 2023
Filing Date:
January 24, 2022
Export Citation:
Assignee:
ASM L Netherlands B.V.
International Classes:
G03F7/20; H01L21/683
Domestic Patent References:
| JP2011192992A | ||||
| JP2012164996A | ||||
| JP2016106274A |
Foreign References:
| WO2017102162A1 |
Attorney, Agent or Firm:
Yoshiyuki Inaba
Toshifumi Onuki
Akihiko Eguchi
Kazuhiko Naito
Toshifumi Onuki
Akihiko Eguchi
Kazuhiko Naito
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