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Patent Searching and Data


Title:
SUBSTRATE HOLDER
Document Type and Number:
Japanese Patent JPH06286869
Kind Code:
A
Abstract:

PURPOSE: To provide a substrate holder enabling a substrate (wafer) with the clean surface to be efficiently obtained and lengthening the change cycle of cleaning liquid or the like.

CONSTITUTION: A substrate holder 2 is provided with frame members 25, 25, 26, 26 laid two each in the upper and lower stages across leg parts 20, 20 so as to be able to hold a wafer 1 in the vertical attitude. The upper stage frame members 25, 25 support both side parts of the wafer 1, and the lower stage frame members 26, 26 support the obliquely lowerfer 1. Grooves 27, 28 for inserting the outer peripheral edge of the wafer 1 are formed at the frame members 25, 26. In order to remove water droplets accumulated between the grooves 27, 28 and the wafer 1, relief parts communicated with the grooves 27, 28 and opened facing downward or obliquely downward are formed at the bottom parts of the grooves 27, 28. The clean wafer can be thereby obtained, and the time required for drying can be shortened.


Inventors:
IIDA HIDEKAZU
Application Number:
JP7797493A
Publication Date:
October 11, 1994
Filing Date:
April 05, 1993
Export Citation:
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Assignee:
JAPAN ENERGY CORP
International Classes:
B65G49/07; H01L21/304; H01L21/306; H01L21/673; H01L21/68; (IPC1-7): B65G49/07; H01L21/304; H01L21/306; H01L21/68
Attorney, Agent or Firm:
Hiroshi Arafune (1 person outside)