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Patent Searching and Data


Title:
SUBSTRATE FOR INSPECTION AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
Document Type and Number:
Japanese Patent JP2009272541
Kind Code:
A
Abstract:

To provide a means of accurately arranging a solid immersion lens at a roughly specified fault place when a semiconductor element is inspected by an OBIRCH method or the like.

A substrate for inspection is disposed on a back of a semiconductor substrate having an electronic circuit formed on a top surface, and includes a lens acting to light propagated in the semiconductor substrate along its thickness. Defining an xy orthogonal coordinate system having, as an xy plane, a plane parallel to the top surface of the substrate for inspection, the lens converges light in a cross section perpendicular to a (y) axis and does not converge light in a cross section perpendicular to an (x) axis.


Inventors:
ITO SEIGO
TANAKA KAZUMI
Application Number:
JP2008123482A
Publication Date:
November 19, 2009
Filing Date:
May 09, 2008
Export Citation:
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Assignee:
FUJITSU MICROELECTRONICS LTD
International Classes:
H01L21/66
Attorney, Agent or Firm:
Keishiro Takahashi
Mikio Kuruyama