Title:
Substrate irradiation equipment
Document Type and Number:
Japanese Patent JP6000441
Kind Code:
B2
Abstract:
Known apparatuses for irradiating a substrate include a receptacle for the substrate to be irradiated having a circular irradiation surface and a first optical emitter having at least one emitter tube arranged in an illumination plane extending parallel to the irradiation surface. The illumination length of the emitter tube includes a middle section and two end sections, the length of the middle section accounting for at least 50% of the illumination length. The receptacle and the optical emitter are movable relative to each other. An apparatus for thermal treatment of a substrate, enabling ho-mogeneous and/or rotationally symmetrical heating of the substrate and requiring less complexity in its design and control technology, includes a middle section of the emitter tube having a steadily decreasing curvature, provided that the illumination length of the emitter tube extends over an angle of curvature of less than 2π.
Inventors:
Sven Rinov
Larry the von Revel
Larry the von Revel
Application Number:
JP2015502117A
Publication Date:
September 28, 2016
Filing Date:
January 18, 2013
Export Citation:
Assignee:
Heraeus Noblelight GmbH
International Classes:
B01J19/12; H01K7/00; H01L21/02
Domestic Patent References:
| JP5047688A | ||||
| JP2002161731A | ||||
| JP2007537582A | ||||
| JP11040503A | ||||
| JP2006078019A | ||||
| JP63055428U |
Foreign References:
| WO2001013679A1 | ||||
| US4859832 | ||||
| US20050217799 |
Attorney, Agent or Firm:
Einzel Felix-Reinhard
Hiroyasu Ninomiya
Hiroyasu Ninomiya