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Patent Searching and Data


Title:
SUBSTRATE MANUFACTURING METHOD AND SUBSTRATE MANUFACTURING APPARATUS
Document Type and Number:
Japanese Patent JP2014099520
Kind Code:
A
Abstract:

To provide a substrate manufacturing method which has less incidence of a level difference on a surface of a thin film.

A substrate manufacturing method comprises: landing in droplets of a thin film material on a plurality of first landing points which are distributed in a first region on a substrate and subsequently curing at least a surface layer part of the thin film material landed on the first landing points; and landing in droplets of the thin film material on a plurality of second landing points which are distributed in a second region after curing the thin film material landed on the first landing points and subsequently curing at least a surface layer part of the thin film material landed on the second landing points. The first region and the second region partially overlap each other at an overlapping region. A density of the first landing points in the overlapping region is lower than a density of the first landing points in the first region other than the overlapping region. A density of the second landing points in the overlapping region is lower than a density of the second landing points in the second region other than the overlapping region.


Inventors:
OKAMOTO YUJI
Application Number:
JP2012250810A
Publication Date:
May 29, 2014
Filing Date:
November 15, 2012
Export Citation:
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Assignee:
SUMITOMO HEAVY INDUSTRIES
International Classes:
H05K3/28; B05C5/00; B05C11/10; B05D1/26; B05D3/02
Attorney, Agent or Firm:
Mikio Kuruyama