Title:
SUBSTRATE PROCESSING APPARATUS ANS SUBSTRATE PROCESSING METHOD
Document Type and Number:
Japanese Patent JP2016167568
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus and a substrate processing method, which make it possible to discharge a process liquid which is temperature controlled at intended high temperature from a process liquid nozzle while achieving reduction in time required for pre-dispensing and/or achieving reduction in consumption of a process liquid for pre-dispensing.SOLUTION: A substrate processing apparatus 1 includes: a chemical nozzle 7 having a nozzle pipe 41 in which a chemical flow path 42 is zoned inside and a discharge port 46 where the chemical flow path 42 opens; a circulation route 22 which holds the chemical while keeping the temperature at a predetermined high temperature higher than ordinary temperature; and a first chemical pipe 11 for guiding the chemical held by the circulation route 22 to the chemical nozzle 7. The substrate processing apparatus further includes an induction heating unit 9 for inductively heating a pipe wall 41b of the nozzle pipe 41 which is composed to include a magnetic induction body material.SELECTED DRAWING: Figure 5
Inventors:
KOBAYASHI KENJI
Application Number:
JP2015047569A
Publication Date:
September 15, 2016
Filing Date:
March 10, 2015
Export Citation:
Assignee:
SCREEN HOLDINGS CO LTD
International Classes:
H01L21/304; H01L21/027; H01L21/306
Domestic Patent References:
| JP2000223394A | 2000-08-11 | |||
| JP2001203138A | 2001-07-27 | |||
| JP2000124185A | 2000-04-28 | |||
| JPH0957176A | 1997-03-04 | |||
| JPH1167624A | 1999-03-09 | |||
| JPH06196469A | 1994-07-15 |
Foreign References:
| US20080011322A1 | 2008-01-17 | |||
| US20140231010A1 | 2014-08-21 |
Attorney, Agent or Firm:
Inaoka cultivation
Mio Kawasaki
Goromaru Masami
Mio Kawasaki
Goromaru Masami