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Title:
SUBSTRATE PROCESSING APPARATUS, LOAD LOCK CHAMBER UNIT, AND METHOD FOR CARRYING OUT CONVEYING DEVICE
Document Type and Number:
Japanese Patent JP2007073540
Kind Code:
A
Abstract:

To provide a substrate processing apparatus in which a conveying device in a conveying chamber can be carried out of the substrate processing apparatus regardless of the height of an installation place.

The substrate processing apparatus comprises a processing chamber for performing predetermined processing on a substrate in vacuum, a conveying chamber 20 coupled with the processing chamber and provided with the conveying device for conveying the substrate while being held in vacuum, and a load lock chamber 30 provided between the conveying chamber 20 and a substrate container on the atmosphere side, wherein a space exists under the load lock chamber 30. The conveying device can be divided into an upper structure and a lower structure 500B, wherein the upper structure can be carried out of the substrate processing apparatus from above the conveying chamber 20, and the lower structure 500B can be carried out of the apparatus from the underside of the conveying chamber 20 through the space under the load lock chamber 30.


Inventors:
NAKAGOME YOICHI
NAKAYAMA HIDEKI
Application Number:
JP2005255291A
Publication Date:
March 22, 2007
Filing Date:
September 02, 2005
Export Citation:
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Assignee:
TOKYO ELECTRON LTD
International Classes:
H01L21/677; H01L21/02
Domestic Patent References:
JPH11354603A1999-12-24
JP2005093807A2005-04-07
JPH10247675A1998-09-14
JP2002237510A2002-08-23
JP2001160578A2001-06-12
JP2001044267A2001-02-16
JP2003037147A2003-02-07
Attorney, Agent or Firm:
Hiroshi Takayama