To suppress an increase in cycle time in case when a slit nozzle with directionality in the scanning direction is employed.

Two slit nozzles 41a and 41b with directionality in the scanning direction are provided to a bridging structure of the substrate processing apparatus 1. At this time, the slit nozzle 41a is provided in a manner that (+X) direction is coincided with the scanning direction, and the slit nozzle 41b is provided in a manner that (-X) direction is coincided with the scanning direction. When a substrate 90 exists in the (+X) direction of the bridging structure, the bridging structure is moved in the (+X) direction and a resist liquid is discharged from the slit nozzle 41a. On the other hand, when the substrate 90 exists in the (-X) direction of the bridging structure, the bridging structure is moved in the (-X) direction and the resist liquid is discharged from the slit nozzle 41b.