Title:
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
Document Type and Number:
Japanese Patent JP2020164321
Kind Code:
A
Abstract:
To provide a technique possible to detect a transfer error in a transfer direction of a substrate with high accuracy and low cost, in a substrate processing apparatus for processing a long strip of a substrate while transferring it.SOLUTION: A substrate processing apparatus includes: a tension detection unit 50 that detects a tension of a transferred substrate; an encoder 40 that detects an amount of rotational drive of a roller 12 that transfers the substrate; edge position detection units 31, 32 that detect a position of an edge of the substrate in a width direction; and a transfer error calculation unit 81 that calculates a transport error in the transfer direction of the substrate. The transfer error calculation unit 81 has an arithmetic unit 200 that has been learned by machine learning and outputs the transfer error in the transfer direction of the substrate, based on at least one of a detection result of the tension of the substrate, a detection result of the amount of the rotational drive of the roller, and a detection result of the position of the edge of the substrate in the width direction.SELECTED DRAWING: Figure 7
Inventors:
YOSHIDA MITSUHIRO
Application Number:
JP2019068582A
Publication Date:
October 08, 2020
Filing Date:
March 29, 2019
Export Citation:
Assignee:
SCREEN HOLDINGS CO LTD
International Classes:
B65H26/02; B41J2/01; B41J29/393; B65H26/04
Domestic Patent References:
| JP2018162161A | 2018-10-18 | |||
| JP2018016412A | 2018-02-01 | |||
| JPH11202419A | 1999-07-30 | |||
| JP2016146088A | 2016-08-12 |
Foreign References:
| WO2016194703A1 | 2016-12-08 |
Attorney, Agent or Firm:
Takami Nishida