Title:
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM AND OPERATION METHOD
Document Type and Number:
Japanese Patent JP2023109237
Kind Code:
A
Abstract:
To provide a technique for enabling an electron generator to be easily exchanged.SOLUTION: A disclosed substrate processing apparatus includes a chamber, an electron generator, a holder, and one or more power supply sources. The electron generator includes a substrate, a plurality of electron emission elements, and a plurality of first contact electrodes. The holder is configured to detachably hold the electron generator in the chamber. The holder includes a ring body and a plurality of second contact electrodes. One or more power supply sources are electrically connected to the electron generator through the holder. One or more power supply sources are electrically connected to the corresponding electron emission element out of the plurality of electron emission devices via the corresponding second contact electrode out of the plurality of second contact electrodes and the corresponding first contact electrode out of the plurality of first contact electrodes.SELECTED DRAWING: Figure 2
Inventors:
KUBOTA SHINJI
Application Number:
JP2022010642A
Publication Date:
August 08, 2023
Filing Date:
January 27, 2022
Export Citation:
Assignee:
TOKYO ELECTRON LTD
International Classes:
H01L21/3065; H01L21/677; H01L21/683
Attorney, Agent or Firm:
Yoshiki Hasegawa
Yoshiki Kuroki
Junji Kashiwaoka
Yoshiki Kuroki
Junji Kashiwaoka
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