Title:
SUBSTRATE PROCESSING APPARATUS
Document Type and Number:
Japanese Patent JP2004290935
Kind Code:
A
Abstract:
To reduce particles accumulated in a processing section of a substrate processing apparatus for degrading and removing e.g., organic matters attached to the substrate by using ultraviolet rays, to maintain high degree of cleanliness, and to improve the yield.
A processing section 2 having a carrying-in port 2a, a carrying-out port 2b, and an exhaust port 2c is provided inside the apparatus. A middle section 6 to be supplied with air from which suspended particles are removed is provided in a section other than the processing section within the apparatus. The middle section 6 and the processing section 2 are communicated with multiple air supply openings 2d.
Inventors:
ISHIDA HIROMI
Application Number:
JP2003090821A
Publication Date:
October 21, 2004
Filing Date:
March 28, 2003
Export Citation:
Assignee:
OPTREX KK
NIPPON SEIKI CO LTD
NIPPON SEIKI CO LTD
International Classes:
B08B7/00; B01J19/12; B08B5/00; H01L21/304; (IPC1-7): B08B7/00; B01J19/12; B08B5/00; H01L21/304
Attorney, Agent or Firm:
Shunsuke Nakao
Takashi Ito
Naoko Okura
Fumari Tamari
Takeyuki Suzuki
Shiro Isoda
Takashi Ito
Naoko Okura
Fumari Tamari
Takeyuki Suzuki
Shiro Isoda
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