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Title:
SUBSTRATE PROCESSING APPARATUS
Document Type and Number:
Japanese Patent JP2009246339
Kind Code:
A
Abstract:

To provide a substrate processing apparatus for recognizing easily a relation of each abnormal substrate spread over two or more batches.

The substrate processing apparatus 10 includes a display means 16, a substrate holding member for holding the substrate, a storing means for accumulating and storing production information of the substrate at the time of substrate treatment for every batch, a selection receive means for receiving the selection of two or more batches stored in the storing means, and a display control means for displaying the substrate information, as information about the holding state of the substrate by using the substrate holding member with respect to two or more batches received by the selection receive means, on the display means under control.


Inventors:
AKAO NORINOBU
YAMAMOTO KAZUYOSHI
Application Number:
JP2008333178A
Publication Date:
October 22, 2009
Filing Date:
December 26, 2008
Export Citation:
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Assignee:
HITACHI INT ELECTRIC INC
International Classes:
H01L21/02; C23C16/52; G01D9/00; H01L21/205; H01L21/22; H01L21/31
Attorney, Agent or Firm:
Patent Business Corporation IPS