Title:
SUBSTRATE PROCESSING APPARATUS
Document Type and Number:
Japanese Patent JP2023175121
Kind Code:
A
Abstract:
To quickly export a substrate after processing.SOLUTION: A substrate processing apparatus comprises a processing container, a stage, an exhaust port, a driving part, a clamp ring, and a pressure regulator mechanism. The stage is provided in the processing container, and the substrate is mounted thereon. The exhaust port is arranged around the stage along an inner side wall of the processing container. The driving part lifts the stage between a processing position that is a position when the processing is performed on the substrate mounted on the stage and an export position that is a position that is a position lower than the processing position and the position when the substrate is transported onto the stage and when the substrate is exported from the stage. The clamp ring is arranged on a peripheral edge of the substrate on the stage and covers the peripheral edge of the substrate when the stage is at the processing position, and is supported by a shelf part provided on the side wall of the processing container when the stage is at the export position. The pressure regulator mechanism suppresses a pressure difference between a space above the substrate on the stage and a space below the stage.SELECTED DRAWING: Figure 2
Inventors:
UMEHARA NAOKI
NOZAWA HIDEJI
YONEDA RYOHEI
YAMAGUCHI TATSUYA
NOZAWA HIDEJI
YONEDA RYOHEI
YAMAGUCHI TATSUYA
Application Number:
JP2022087409A
Publication Date:
December 12, 2023
Filing Date:
May 30, 2022
Export Citation:
Assignee:
TOKYO ELECTRON LTD
International Classes:
H01L21/31; C23C16/44; H01L21/3065; H01L21/683
Attorney, Agent or Firm:
Sakai International Patent Office
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