Title:
SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD
Document Type and Number:
Japanese Patent JP2022025670
Kind Code:
A
Abstract:
To make it possible to apply a substrate processing device that optically detects foreign substances in a supply channel through which a liquid supplied to a substrate flows to more types of liquids.SOLUTION: A substrate processing device includes a supply channel 12A, through which a liquid supplied to a substrate W flows, and a foreign substance detection unit 2, which can detect foreign substances in the liquid on the basis of a signal obtained by a light receiving unit 48 receiving light emitted from a flow channel formation portion 14A forming a part of the supply channel as a result of irradiation of the flow channel formation portion 14A light with light, which is near-infrared light, by a light-emitting unit 44.SELECTED DRAWING: Figure 3
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Inventors:
AZUMA KODAI
HAYASHI MASAHITO
NOGUCHI KOHEI
HAYASHI MASAHITO
NOGUCHI KOHEI
Application Number:
JP2020128629A
Publication Date:
February 10, 2022
Filing Date:
July 29, 2020
Export Citation:
Assignee:
TOKYO ELECTRON LTD
International Classes:
H01L21/027; B05C11/00
Attorney, Agent or Firm:
Patent Corporation Yayoi Patent Office