To provide a substrate processing device which can stably carry in or out even a large substrate and a thick plate substrate, and in which the capacity of a chamber is suppressed.
A substrate processing device for performing predetermined processing to a substrate includes: a chamber which has an openable/closable top cover and a base provided with support means supporting the substrate, and in which the top cover is placed on the base so that a sealed state substrate housing space is formed; a conveyor which supports a substrate carried in from the outside of the chamber and a substrate carried out to the outside of the chamber from below and transfers them at a transfer position determined above the base; and a conveyor movement mechanism which can move the conveyor between the transfer position and a retreat position outside the chamber. When the substrate is transferred, the conveyor movement mechanism moves the conveyor to the transfer position. When the substrate is supported by the support means and predetermined processing is performed to the substrate in the chamber in the sealed state, the conveyor movement mechanism moves the conveyor to the retreat position.
HIRAI TAKANORI
KAWAGUCHI YASUHIRO
| JP2008166820A | 2008-07-17 | |||
| JP2002334825A | 2002-11-22 | |||
| JP2008063048A | 2008-03-21 |
| US4217977A | 1980-08-19 |
Takahiro Arita