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Patent Searching and Data


Title:
SUBSTRATE PROCESSING DEVICE
Document Type and Number:
Japanese Patent JP2002057203
Kind Code:
A
Abstract:

To solve the problems, such as restraining of increase in the occupancy area, deflection of a substrate or facilitation of maintenance.

In a transfer system for performing transfers between an atmosphere side and a processing chamber 2 via an intermediate chamber 7, substrates are transferred by moving a substrate-holding tool 92 for holding two substrates 9 in a substantially vertically erected state. The system can move the holding tool 92 in the intermediate chamber, in the horizontal second direction perpendicular to a first direction connecting the intermediate chamber 7 to the load lock chamber 11 or the process chamber 2. Two load lock chambers 11 are provided on one side of the intermediate chamber 4, the process chamber 2 is provided on the opposite side thereof, and the system retreats the holding tool 92 in the process chamber 4 to make it withdraw to the load lock chamber 11. A heater 6 is provided in the intermediate chamber 4 to heat the substrates to a prescribed temperature prior to the processing.


Inventors:
Takahashi, Nobuyuki
Application Number:
JP2000000245768
Publication Date:
February 22, 2002
Filing Date:
August 14, 2000
Export Citation:
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Assignee:
ANELVA CORP
International Classes:
H05H1/46; B65G35/06; B65G49/06; C23C14/50; G02F1/13; G02F1/1333; H01L21/677; (IPC1-7): H01L21/68; B65G49/06; C23C14/50; G02F1/13; G02F1/1333