Title:
SUBSTRATE PROCESSING DEVICE
Document Type and Number:
Japanese Patent JP2006019525
Kind Code:
A
Abstract:
To make a substrate processing device more compact.
The substrate processing device 10 specifically processes a substrate B carried at a nearly horizontal attitude along a conveyance path 171. The device disposes in series a liquid collection type nozzle device 20 constituted to collect a supplied processing liquid from the substrate B as a processing liquid supply device supplying the specified processing liquid to the carrying substrate B, and an air knife 30 constituted to blow the remaining processing liquid on the substrate B with an air current as a processing removing device removing the processing liquid left on the substrate B, after the processing liquid is supplied are arranged in series along the conveyance path 171.
Inventors:
YAMAGUCHI KAZUHIKO
MURAOKA YUSUKE
MURAOKA YUSUKE
Application Number:
JP2004196045A
Publication Date:
January 19, 2006
Filing Date:
July 01, 2004
Export Citation:
Assignee:
FUTURE VISION KK
International Classes:
H01L21/304; B08B3/02
Attorney, Agent or Firm:
Etsushi Kotani
Takao Ito
Jiro Higuchi
Takao Ito
Jiro Higuchi