SUBSTRATE PROCESSING DEVICE

Japanese Patent JP3735175

B2

PROBLEM TO BE SOLVED: To realize a substrate processing device which is capable of restraining particles from occurring and being easily lessened in floor space by a method wherein the device is equipped with a first rotary member provided in a direction nearly vertical to a transfer table, a second rotary member provided in the direction nearly vertical to the first rotary member, and a substrate holding means which is connected to the second rotary member in such a manner that it is rotabale around a drive shaft which extends nearly in a vertical direction.
SOLUTION: A substrate transfer robot is equipped with a transfer table 1 fixed to the base frame of a substrate processing device, a first rotary arm 11 connected to a first rotary drive shaft θ1 which extends in a vertical direction in such a manner that it is set rotatable around the shaft θ1, a second rotary arm 12 connected to a second rotary drive shaft θ2 which extends in a vertical direction in such a manner that it is set rotatable around the shaft shaft θ2, a third arm 13 which serves also as a substrate holder and is connected to a third rotary drive shaft θ3 which extends in a vertical direction in such a manner that it is set rotatable around the shaft shaft θ3, and motors 21 to 23 as drive sources, which a substrate is transferred in a horizontal direction without rectilinear sliding. A sliding distance is short, and particles occur less.

Takashi Hara

JP4926897A

January 18, 2006

March 04, 1997

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Dainippon Screen Mfg. Co., Ltd.

H01L21/677; H01L21/02; H01L21/027; H01L21/304; H01L21/68; (IPC1-7): H01L21/68; H01L21/02; H01L21/027; H01L21/304

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