Title:
SUBSTRATE-PROCESSING EQUIPMENT AND CLEANING METHOD OF SLIT NOZZLE TIP
Document Type and Number:
Japanese Patent JP2004047616
Kind Code:
A
Abstract:
To provide a substrate-processing equipment, wherein the tip part of a slit nozzle is cleaned at application of a resist, for stable discharging of the resist at the start of application.
An absorbing member 71, which absorbs a resist well or a guide member comprising a plurality of narrow tubes, is arranged near a discharge opening 41d of a slit nozzle 41. A pre-dispensed resist 77 is selectively absorbed or guided by the absorbing member 71 or the guide member, under capillary action. Thus, the resist is suppressed from sticking to a tip part 41e of the slit nozzle 41. Since the resist concentration in the discharge opening 41d is even, the thickness of a film is stabilized, when the resist is applied.
Inventors:
FUKUCHI TAKESHI
UENO KOICHI
KISE KAZUO
UENO KOICHI
KISE KAZUO
Application Number:
JP2002201272A
Publication Date:
February 12, 2004
Filing Date:
July 10, 2002
Export Citation:
Assignee:
DAINIPPON SCREEN MFG
International Classes:
G03F7/16; B05B15/02; B05C5/02; B05C11/10; B05D1/26; B05D3/10; H01L21/027; (IPC1-7): H01L21/027; B05B15/02; B05C5/02; B05C11/10; B05D1/26; B05D3/10; G03F7/16
Attorney, Agent or Firm:
Shigeaki Yoshida
Yoshitake Hidetoshi
Takahiro Arita
Yoshitake Hidetoshi
Takahiro Arita