Title:
基材処理装置及び方法
Document Type and Number:
Japanese Patent JP7356809
Kind Code:
B2
Abstract:
The invention relates to a substrate processing apparatus comprising a reaction chamber provided with a substrate rack for holding a plurality of substrates in the reaction chamber. The substrate rack may have a plurality of spaced apart substrate holding provisions configured to hold the plurality of substrates. The apparatus may have an illumination system constructed and arranged to irradiate radiation with a range from 100 to 500 nanometers onto a top surface of the substrates.
More Like This:
Inventors:
Dieter Pieru
Cornelis Thaddeus Herbsreb
Werner Kunapen
Belt Young Brute
Stefen van Arde
Kelly Hoven
Theodorus Oosterlaken
Chris De Riedel
Lucian Zidira
Cornelis Thaddeus Herbsreb
Werner Kunapen
Belt Young Brute
Stefen van Arde
Kelly Hoven
Theodorus Oosterlaken
Chris De Riedel
Lucian Zidira
Application Number:
JP2019057702A
Publication Date:
October 05, 2023
Filing Date:
March 26, 2019
Export Citation:
Assignee:
AS M IP Holding Besloten Fennaught Shap
International Classes:
H01L21/31; C23C16/48; H01L21/683
Domestic Patent References:
| JP2013241678A | ||||
| JP2094631A | ||||
| JP2012114350A |
Attorney, Agent or Firm:
Osamu Yamamoto
Toru Miyamae
Motoharu Nakanishi
Shigeo Takeuchi
Yoshiyuki Tamura
Toru Miyamae
Motoharu Nakanishi
Shigeo Takeuchi
Yoshiyuki Tamura