Title:
基板処理装置及び基板処理方法
Document Type and Number:
Japanese Patent JP6865079
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To suppress the presence of bubbles in a filter.SOLUTION: A liquid processing unit U1 includes a processing liquid path 70 which is a path of a processing liquid used for liquid processing, a filter unit 30 provided in the processing liquid path 70 and removing a foreign matter in the processing liquid, and a switching valve V14 that switches a first state in which the processing liquid is supplied to the filter unit 30 via the processing liquid path 70 and a second state in which carbon dioxide gas which is more easily dissolved in the processing liquid than the air is supplied to the filter unit 30 via the processing liquid path 70.SELECTED DRAWING: Figure 4
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Inventors:
Arno Align Jean Dow Endorfer
Application Number:
JP2017057488A
Publication Date:
April 28, 2021
Filing Date:
March 23, 2017
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
H01L21/027; B01D19/00; B01D24/48; B01D29/60; B01F1/00; H01L21/304
Domestic Patent References:
| JP2017028299A | ||||
| JP2002177827A | ||||
| JP10144604A | ||||
| JP2005183791A | ||||
| JP2013206962A |
Attorney, Agent or Firm:
Yoshiki Hasegawa
Yoshiki Kuroki
Junji Kashiwaoka
Yasushi Naito
Yoshiki Kuroki
Junji Kashiwaoka
Yasushi Naito