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Title:
基板処理装置および基板搬送方法
Document Type and Number:
Japanese Patent JP7390142
Kind Code:
B2
Abstract:
Disclosed are a substrate treating apparatus and a substrate transporting method. The substrate treating apparatus includes a first transport mechanism. The first transport mechanism includes a hand. A hand includes a base, a suction portion, a first receiver, a second receiver, and a receiver driving unit. The suction portion is attached to the base. The suction portion flows gas along a top face of a substrate, and sucks the substrate upward without contacting the substrate. The first receiver and the second receiver are supported on the base. The first receiver and the second receiver are disposed below the substrate sucked by the suction portion. The first receiver and the second receiver can receive a back face of the substrate. The receiver driving unit moves the second receiver with respect to the base. The receiver driving unit causes the second receiver to access the first receiver and to move away from the first receiver.

Inventors:
▲高▼山 祐一
Kazuhiko Nakazawa
Hiromitsu Kama
Toshihito Morioka
Takuya Satoh
Noriyuki Kikumoto
Application Number:
JP2019171512A
Publication Date:
December 01, 2023
Filing Date:
September 20, 2019
Export Citation:
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Assignee:
Screen Holdings Co., Ltd.
International Classes:
H01L21/677; B25J15/06; B65G49/06; B65G49/07
Domestic Patent References:
JP2014127654A
JP2017120805A
JP2006024683A
JP2008177239A
JP2004235622A
JP2004083180A
JP2018026579A
JP2006049449A
Attorney, Agent or Firm:
Tsutomu Sugitani
Hiroyuki Todaka
Tomohiko Sugiya
Kaname Kurihara
Nobuyoshi Aono