SUBSTRATE PROCESSING EQUIPMENT

Title:

SUBSTRATE PROCESSING EQUIPMENT

Document Type and Number:

Japanese Patent JP2004055814

Kind Code:

A

Abstract:

To provide substrate processing equipment which can produce a high-quality substrate by properly drying it.

The substrate processing equipment comprises a storage shelf 107 for storing a plurality of substrates, and an air supply chamber 101 for supplying the same volume of clean air to each stage of the storage shelf. Between the air supply chamber and the storage shelf, there are partition walls 105a and 105b, each of which is formed with the same number of air supply holes 106 corresponding to each stage of the storage shelf. The air supply chamber 101 is equipped with an HEPA unit 104. The clean air blown out of the HEPA unit 104 is retained in the air supply chamber once, so that the air pressure at the time of blowing off from the HEPA unit 104 is buffered by the air supply chamber 101. When the air pressure inside the air supply chamber becomes nearly homogeneous, the air is supplied to each substrate from each air supply hole.

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Inventors:

TAKASU KATSUAKI

Application Number:

JP2002211045A

Publication Date:

February 19, 2004

Filing Date:

July 19, 2002

Export Citation:

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Assignee:

HIRATA SPINNING

International Classes:

G02F1/13; G02F1/1333; H01L21/027; (IPC1-7): H01L21/027; G02F1/13; G02F1/1333

Attorney, Agent or Firm:

Yasunori Otsuka
Shiro Takayanagi
Yasuhiro Otsuka
Shuji Kimura

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