Title:
基板処理装置
Document Type and Number:
Japanese Patent JP7195841
Kind Code:
B2
Abstract:
A substrate treating apparatus includes an indexer, a first processing section, a first transport mechanism, a second processing section, a second transport mechanism, a first mount table, a second mount table, and a controller. The first transport mechanism repeatedly performs a first cycle operation composed of three access operations (specifically, a first access operation, a second access operation, and a third access operation). The second transport mechanism repeatedly performs a second cycle operation composed of three access operations (specifically, a fourth access operation, a fifth access operation, and a sixth access operation).
Inventors:
Maeda Masashi
Masaki Nishida
Masaki Nishida
Application Number:
JP2018178010A
Publication Date:
December 26, 2022
Filing Date:
September 21, 2018
Export Citation:
Assignee:
Screen Holdings Co., Ltd.
International Classes:
H01L21/677; H01L21/027
Domestic Patent References:
| JP2006310698A | ||||
| JP2017163103A | ||||
| JP2017041513A | ||||
| JP2006310731A |
Attorney, Agent or Firm:
Tsutomu Sugitani
Hiroyuki Todaka
Tomohiko Sugiya
Kurihara Kaname
Nobuyoshi Aono
Hiroyuki Todaka
Tomohiko Sugiya
Kurihara Kaname
Nobuyoshi Aono