Title:
基板処理装置
Document Type and Number:
Japanese Patent JP7364460
Kind Code:
B2
Abstract:
A holding mechanism holds a substrate horizontally. A rotation mechanism rotates the holding mechanism holding the substrate. A nozzle supplies a processing liquid to the substrate. A nozzle arm holds the nozzle. An arm actuation mechanism moves the nozzle arm between a processing position overlapping the substrate in plan view and a retracted position displaced from the substrate in plan view. A cup portion is disposed around the holding mechanism, and receives the processing liquid from the substrate. A cup actuation mechanism moves the cup portion up and down between an upper position and a lower position. A first container is fixed to the cup portion to be movable up and down integrally with the cup portion, and can accommodate the nozzle at the retracted position.
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Inventors:
Yosuke Yasutake
Hiroaki Ishii
Wataru Sakai
Yutaka Ikegami
Hiroaki Ishii
Wataru Sakai
Yutaka Ikegami
Application Number:
JP2019233844A
Publication Date:
October 18, 2023
Filing Date:
December 25, 2019
Export Citation:
Assignee:
Screen Holdings Co., Ltd.
International Classes:
H01L21/304
Domestic Patent References:
| JP2015046522A | ||||
| JP2015023048A | ||||
| JP2018049909A |
Attorney, Agent or Firm:
Hidetoshi Yoshitake
Takahiro Arita
Takahiro Arita