基板処理装置

Japanese Patent JP7447327

B2

To provide a substrate processing device capable of supplying power to an electric component rotating together with a rotating table and transmitting/receiving a signal and the like without adversely affecting the rotation of the rotating table.SOLUTION: The substrate processing device includes: a rotating table 100 rotating while holding a substrate W; an electric component rotating together with the rotating table; a first electrode part 161A including a plurality of first electrodes 164A that are electrically connected to the electric component through a plurality of first conductive lines 148A, 148B, 149 and arranged to be distributed around a rotation axis; an electric device for supplying power to the electric component and transmitting/receiving a signal and the like; a second electrode part 161B including a plurality of second electrodes 164B that are electrically connected to the electric device through a plurality of second conductive lines 168A, 168B, 169 and provided at positions such that the second electrodes can be brought into contact with each of the plurality of first electrodes; and an electrode moving mechanism 162 that relatively move the first electrode part and the second electrode part in a direction of the rotation axis such that the electrode parts are brought into contact with each other or separated from each other.SELECTED DRAWING: Figure 2

Satoshi Morita
Masami Nakumoto
Katsuhiro Morikawa
Koichi Mizunaga
Kozo Kawahara

JP2023025386A

March 11, 2024

February 21, 2023

Click for automatic bibliography generation  

東京エレクトロン株式会社

C25D21/00; C25D17/06; C25D17/12

JP2000012503A
JP2002222848A
JP2015154063A
JP2017208374A
JP2007191728A
JP2005146399A
JP2007335709A
JP2010087197A
JP2009117845A
JP2009148784A
JP8162518A

US20080258411
KR1020140087149A

Manabu Miyajima
Hideyuki Mori

Previous Patent: Kitchen or laboratory equipment and equipment with display devices

Next Patent: Construction method of steel pipe piles and steel pipe piles