Title:
基板処理方法および基板処理装置
Document Type and Number:
Japanese Patent JP7179568
Kind Code:
B2
Abstract:
A substrate treatment device is provided, including a substrate holding unit holding a substrate and rotating the substrate; plural nozzles each having a discharge port and discharging a treatment liquid from the discharge port at a treatment position; a camera imaging an imaging region from an imaging position to acquire captured images, the imaging region containing the treatment liquid discharged from the discharge port of each nozzle positioned at the treatment position, and the imaging position being above the substrate held on the substrate holding unit and in a plan view, the imaging position being positioned at a central side of the substrate with respect to the nozzles and at an upstream side in a rotation direction of the substrate holding unit with respect to the nozzles; and an image processing unit determining a discharge state of the treatment liquid based on the captured images.
Inventors:
Eiji Karihara
Yuji Okita
Hiroaki Kakuma
Tatsuya Masui
Yuji Okita
Hiroaki Kakuma
Tatsuya Masui
Application Number:
JP2018189981A
Publication Date:
November 29, 2022
Filing Date:
October 05, 2018
Export Citation:
Assignee:
Screen Holdings Co., Ltd.
International Classes:
H01L21/304; B05C11/08; G06V10/25; G06V10/42; G06V10/764; H01L21/027
Domestic Patent References:
| JP2015173148A | ||||
| JP2017029883A | ||||
| JP2015152475A | ||||
| JP2000082646A | ||||
| JP2016136572A | ||||
| JP2016178238A | ||||
| JP2016115863A |
Foreign References:
| WO2018173861A1 |
Attorney, Agent or Firm:
Hidetoshi Yoshitake
Takahiro Arita
Takahiro Arita