Title:
SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE TURNOVER DEVICE
Document Type and Number:
Japanese Patent JP2014169177
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a substrate processing system capable of continuously turning over substrates.SOLUTION: The substrate processing system includes: multiple first and second conveyance devices disposed at intervals; and a substrate turnover device 100 having a pair of holding arm groups 102 disposed so as to have rotational symmetry around a rotary shaft 101a, having multiple holding arms 102 to pass through gaps between unit conveyance elements 301 when rotating around the rotary shaft 101a, and capable of being lifted by lift means. Multiple sucker parts 103 provided at holding arms 102 included in one of the pair of holding arm groups 102 are made to stick to a substrate W to be turned over, and after that, the pair of holding arm groups 102 are rotated around the rotary shaft 101a by 180 degrees, thereby the substrate W is turned over. After adhesion of the substrate W and until the turnover is completed, the pair of holding arm groups 102 are made to ascend higher than a position where the substrate W is handed over, and when the adhesion is canceled after the turnover, made to descend to the position where the substrate W is handed over.
Inventors:
NARUO TORU
Application Number:
JP2013043127A
Publication Date:
September 18, 2014
Filing Date:
March 05, 2013
Export Citation:
Assignee:
MITSUBOSHI DIAMOND IND CO LTD
International Classes:
B65H15/00; C03B35/00; B28D1/24
Domestic Patent References:
| JPS6298650U | 1987-06-23 | |||
| JPH0625246U | 1994-04-05 | |||
| JPH01147344U | 1989-10-12 | |||
| JPS4956363A | 1974-05-31 |
Attorney, Agent or Firm:
Hidetoshi Yoshitake
Takahiro Arita
Takahiro Arita