Title:
SUBSTRATE PROCESSOR
Document Type and Number:
Japanese Patent JP2023123190
Kind Code:
A
Abstract:
To provide a substrate processor in which a gas flow passage is designed more freely.SOLUTION: The substrate processor includes: a processing chamber; a substrate processing unit located in the processing chamber and holding a substrate; and a shower head facing the substrate supporting unit. The shower head includes: a shower plate in which a gas flow passage for discharging gas is formed; and a cooling plate for holding and cooling the shower plate. The cooling plate includes: a first plate having a gas distribution layer for distributing gas; and a second plate having a refrigerant flow passage for being supplied with a refrigerant and a gas diffusion space for being supplied with gas distributed by the gas distribution layer; and a fastening member for fastening the first plate and the second plate.SELECTED DRAWING: Figure 2
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Inventors:
SUGIYAMA HIDEKI
YAHATA SHOJIRO
YAMANAKA SHINYA
YAHATA SHOJIRO
YAMANAKA SHINYA
Application Number:
JP2022027110A
Publication Date:
September 05, 2023
Filing Date:
February 24, 2022
Export Citation:
Assignee:
TOKYO ELECTRON LTD
International Classes:
H01L21/3065; C23C16/455; H01L21/31; H05H1/46
Attorney, Agent or Firm:
Tadashige Ito
Tadahiko Ito
Tadahiko Ito
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