Title:
SUBSTRATE PROCESSOR
Document Type and Number:
Japanese Patent JP3605302
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To prevent atmosphere in a substrate processing chamber from being leaked to the outside.
SOLUTION: Pressure sensors 83a, 83b, 83c, and 83d for detecting an exhaust pressure are arranged in the middle of exhaust ducts 82a, 82b, 82c, and 82d. Also, both side brush washing part 50, second carrying chamber 42, surface brush washing part 60, and third carrying chamber 43 are communicated through input ports 84a, 84b, 84c, and 84d, air intake ducts 85a, 85b, 85c, and 85d, and air intake ports 86a, 86b, 86c, and 86d with a clean air space CL. A shutter mechanism 90 is provided related with the air intake ports 86a, 86b, 86c, and 86d, and when the exhaust pressure detected by any pressure sensors 83a, 83b, 83c, and 83d reaches a prescribed pressure value or less, the air intake ports 86a, 86b, 86c, and 86d can be closed by the shutter mechanism 90.
Inventors:
Masami Sawamura
Atsushi Sawada
Atsushi Sawada
Application Number:
JP30440698A
Publication Date:
December 22, 2004
Filing Date:
October 26, 1998
Export Citation:
Assignee:
Dainippon Screen Mfg. Co., Ltd.
International Classes:
H01L21/304; B08B1/04; (IPC1-7): H01L21/304; B08B1/04
Domestic Patent References:
| JP5074752A | ||||
| JP7221064A | ||||
| JP10012523A | ||||
| JP9143742A |
Attorney, Agent or Firm:
Mio Kawasaki
Inaoka cultivation
Inaoka cultivation