Title:
SUBSTRATE PROVIDED WITH HYDROPHILIC OXIDE COATING FILM AND PRODUCTION OF THE SUBSTRATE
Document Type and Number:
Japanese Patent JP3649596
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To obtain a substrate with improved hardness, transparency and durability by coating a substrate with a porous metal oxide film with water- absorbing ultra-microparticles homogeneously dispersed in matrix-forming metal oxide(s).
SOLUTION: The subject hydrophilic oxide coating film provided on a substrate is preferably so designed that, water-absorbing ultra-microparticles included therein consist of silica and/or alumina, matrix-forming porous metal oxide(s) consist of one or more kinds among silica, titania and alumina, and the respective contents of the matrix-forming silica and ultra-microparticle silica are 30-80 wt.% and 20-10 wt.% on an oxide basis, and the film thickness is 50-250 nm. The above coating film can be formed by coating the surface of the substrate with a sol solution comprising organometallic compound(s), water- absorbing ultra-microparticles, an alcohol-soluble organic polymer and a solvent followed by baking; wherein it is preferable that the content of the organic polymer in the sol solution is 0.025-3.0 wt.% and the baking temperature 350-700°C.
Inventors:
Seiji Yamazaki
Hideki Yamamoto
Yoshihiro Nishida
Keiji Honjo
Hideki Yamamoto
Yoshihiro Nishida
Keiji Honjo
Application Number:
JP23545098A
Publication Date:
May 18, 2005
Filing Date:
August 21, 1998
Export Citation:
Assignee:
Central Glass Co., Ltd.
International Classes:
C03C17/00; C03C17/25; C04B35/622; C04B41/87; C23C26/00; (IPC1-7): C03C17/25; C04B35/622; C04B41/87; C23C26/00
Domestic Patent References:
| JP9295835A | ||||
| JP10101377A |
Attorney, Agent or Firm:
Yoshiyuki Nishi
Previous Patent: MAGNETIC LEVITATION CONTROL DEVICE
Next Patent: PRODUCTION OF CHEMICAL VAPOR DEPOSITION SiC FILM
Next Patent: PRODUCTION OF CHEMICAL VAPOR DEPOSITION SiC FILM