SUBSTRATE SURFACE-CLEANING SOLUTION AND METHOD OF CLEANING THE SAME

Japanese Patent JP2003221600

A

To provide a substrate-cleaning solution that can efficiently remove particulate contamination in comparison with the existing techniques in the production process for semiconductor devices and display devices and provide a method of cleaning the same.

The substrate surface-cleaning solution includes at least the following components (A), (B), (C) and (D), has a pH of ≥9, and has a content of the component (C) of 0.01-4 wt.%: (A) an ethylene oxide addition type surfactant having hydrocarbon groups which may be substituted as well as polyoxyethylene groups in the same molecular structure wherein the ratio (m/n) of the carbon atom number in the hydrocarbon groups (m) to the number of the oxyethylene groups (n) in the polyoxyethylene groups is ≤1.5; (B) alkali components; (C) hydrogen peroxide; (D) water.

JP4540512	How to clean the sample cooler
JP2003502135	Description: Liquid carbon dioxide cleaning using natural and conditioned natural solvents.

MORINAGA HITOSHI
MOCHIZUKI HIDEAKI
ITO ATSUSHI

JP2002331915A

August 08, 2003

November 15, 2002

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MITSUBISHI CHEM CORP

B08B3/08; B08B3/10; B08B3/12; C11D1/72; C11D1/722; C11D3/02; C11D3/26; C11D3/37; C11D3/39; C11D11/00; C11D17/08; C23G1/18; H01L21/304; H01L21/306; (IPC1-7): C11D17/08; B08B3/08; B08B3/10; B08B3/12; C11D1/722; C11D3/26; C11D3/39; H01L21/304

JPS63274149A	1988-11-11
JPH11121418A	1999-04-30
JPH0613364A	1994-01-21
JPH05138142A	1993-06-01
JPH11162907A	1999-06-18
JPH06177101A	1994-06-24

Hasegawa Moji

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