SUBSTRATE TRANSFER APPARATUS AND ALIGNER

Title:

SUBSTRATE TRANSFER APPARATUS AND ALIGNER

Document Type and Number:

Japanese Patent JP2002270668

Kind Code:

A

Abstract:

To detect discharge phenomenon with high sensitivity, during the transfer of a substrate.

A substrate transfer apparatus 4 for transferring a substrate P, includes a connection 15 for connecting a support 12 for supporting the substrate P and a grounding potential 16 and a detector 17 for detecting changes in the electrical characteristics of the connection 15.

Inventors:

YOSHIKAWA YUUKI
KATSUME TOSHIHIRO
NARA KEI

Application Number:

JP2001070191A

Publication Date:

September 20, 2002

Filing Date:

March 13, 2001

Export Citation:

Click for automatic bibliography generation Help

Assignee:

NIKON CORP

International Classes:

G03F7/20; B65G49/06; B65G49/07; H01L21/027; H01L21/677; H01L21/68; (IPC1-7): H01L21/68; B65G49/06; B65G49/07; G03F7/20; H01L21/027

Attorney, Agent or Firm:

Masatake Shiga (5 outside)

Previous Patent: SEMICONDUCTOR MANUFACTURING METHOD AND APPARATUS

Next Patent: SUBSTRATE TRANSFER METHOD AND APPARATUS