SUBSTRATE TRANSFER SYSTEM WITH LAMP HEATER, AND CHAMBER PURGE METHOD

Title:

SUBSTRATE TRANSFER SYSTEM WITH LAMP HEATER, AND CHAMBER PURGE METHOD

Document Type and Number:

Japanese Patent JP2023016774

Kind Code:

A

Abstract:

To provide a substrate transfer system capable of efficiently removing substances removable at high temperature such as moisture adhering to an inner wall of a transfer chamber that may be used in transfer of a substrate, and a chamber purge method employing the substrate transfer system.SOLUTION: A substrate transfer system includes a chamber in which at least one through hole is formed in a side surface, a substrate transfer device provided in the chamber and configured to be able to transfer a substrate such as a wafer, and a lamp heater disposed in the chamber.SELECTED DRAWING: Figure 1

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Inventors:

KOBAYASHI WATARU
SUWADA MASAE

Application Number:

JP2022116498A

Publication Date:

February 02, 2023

Filing Date:

July 21, 2022

Export Citation:

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Assignee:

ASM IP HOLDING BV

International Classes:

H01L21/677

Attorney, Agent or Firm:

Atsushi Kuwano

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